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定制镀膜 - 埃纳膜iNAF 定制镀膜 - 埃纳膜iNAF

定制镀膜

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Digital Strategy

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UI Designs

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Content Writing

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Marketing Strategy

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Web Development

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Social Media

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iCVD

引发式化学气相沉积


引发式化学气相沉积(initiated Chemical Vapor Deposition，iCVD)是一种高分子薄膜气相合成技术；在较低加热温度下，诱导引发剂裂解产生自由基，使单体通过自由基聚合反应生成高分子薄膜，并且沉积于基底表面。

与传统适用溶剂的有机聚合物薄膜沉积不同的是，iCVD薄膜由于其气相反应的特点，所生成的薄膜纯净无杂质。

得益于iCVD低温无溶剂的特性，此技术可以用于不同类型的样品基底，特别友好于对外界条件（温度、氧气、机械应力、溶剂等）比较敏感的样品。

John Doe
    John Doe

    Designer

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    Jeniffer Doe
      Jeniffer Doe

      Marketing

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      Claudia Doe
        Claudia Doe

        Consultant

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        Steven Doe
          Steven Doe

          Programmer

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          FAQ.

          Popular Question From Clients

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          Where Can I Find More Information?

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          What Are Your Terms and Conditions?

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